- The report contains detailed information about Nanometrics Incorporated that gives an unrivalled in-depth knowledge about internal business-environment of the company: data about the owners, senior executives, locations, subsidiaries, markets, products, and company history.
- Another part of the report is a SWOT-analysis carried out for Nanometrics Incorporated. It involves specifying the objective of the company's business and identifies the different factors that are favorable and unfavorable to achieving that objective. SWOT-analysis helps to understand company’s strengths, weaknesses, opportunities, and possible threats against it.
- The Nanometrics Incorporated financial analysis covers the income statement and ratio trend-charts with balance sheets and cash flows presented on an annual and quarterly basis. The report outlines the main financial ratios pertaining to profitability, margin analysis, asset turnover, credit ratios, and company’s long-term solvency. This sort of company's information will assist and strengthen your company’s decision-making processes.
- In the part that describes Nanometrics Incorporated competitors and the industry in whole, the information about company's financial ratios is compared to those of its competitors and to the industry. The unique analysis of the market and company’s competitors along with detailed information about the internal and external factors affecting the relevant industry will help to manage your business environment. Your company’s business and sales activities will be boosted by gaining an insight into your competitors’ businesses.
- Also the report provides relevant news, an analysis of PR-activity, and stock price movements. The latter are correlated with pertinent news and press releases, and annual and quarterly forecasts are given by a variety of experts and market research firms. Such information creates your awareness about principal trends of Nanometrics Incorporated business.
About Nanometrics Incorporated
Nanometrics Incorporated provides high-performance process control metrology systems used primarily in the fabrication of semiconductors, high-brightness LEDs, data storage devices, and solar photovoltaics.
The companys automated and integrated metrology systems measure critical dimensions, device structures, overlay registration, topography, and various thin film properties, including film thickness as well as optical, electrical, and material properties. Its process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to wafer-scale packaging applications. Its systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs.
The company offers a line of systems to address the range of metrology requirements in the market.
Automated Standalone Systems
The companys standalone systems are made up of manual, semi-automated and fully automated metrology systems which are employed in high-volume and low-volume production environments. The Atlas XP/Atlas XP+ and Atlas-M represent the companys line of metrology systems providing thin film, wafer stress, optical critical dimension (OCD), and diffraction-based overlay (DBO) for transistor and interconnect metrology applications. The OCD technology is supported by the companys NanoCD suite of solutions including its NanoDiffract software and NanoGen scalable computing engine that enables visualization, modeling, and analysis of complex structures. The Caliper Mosaic provides overlay metrology solutions, providing solutions for 300mm overlay process technologies, available on its Lynx platform. The Unifire system enables users to measure multiple parameters at any given process step in the packaging process flow for critical dimension, overlay, and topography applications.
The company offers automated products for 200mm factories running nominally at 90nm nodes, as well as systems supporting micro-electrical mechanical systems (MEMS). Its Q240AT is a 200mm overlay metrology system incorporating the same measurement technology as the Caliper, extending the technology capability of its customers existing factories. The IVS-185 system supports critical dimension and overlay measurements for semiconductor, MEMS, and HB-LED manufacturing. The NanoSpec 9100 thin film measurement system is capable of handling wafers ranging in size from 75 to 200 millimeters in diameter, and is used in all segments of semiconductor manufacturing, including data storage head manufacturing.
The company offers the Lynx cluster metrology platform.
The companys integrated metrology (IM) systems are installed directly onto wafer processing equipment to provide near real-time measurements for improved process control and maximum throughput. Its IM systems are sold directly to end customers and through OEM channels. Its 90x0 series is qualified for OEM and direct sales supporting thin film and OCD applications. Its NanoCD is sold in conjunction with its IMPULSE and 90x0 systems. The Trajectory system provides in-line measurement of layers in thin film thickness and composition in solar cell and semiconductor applications.
The Materials Characterization products include systems that are used to monitor the physical, optical, electrical and material characteristics of HB-LED, compound semiconductor, strained silicon and silicon-on-insulator (SOI) devices, including composition, crystal structure, layer thickness, dopant concentration, contamination and electron mobility. Tabletop systems are used to manually or semi-automatically measure thin films in engineering and low-volume production environments. Its tabletop models have multiple capabilities and various available configurations, depending on wafer handling, range of films to be measured, uniformity mapping and other customer needs.
The companys VerteX is a photoluminescence (PL) mapping system designed for compound semiconductor metrology applications. The RPMBlue is its PL mapping system designed specifically for the HB-LED segment. It supports Fourier-Transform Infrared (FTIR) automated and manual systems in the QS2200/3300 and QS1200 respectively. The FTIR systems are spectrometers designed for non-destructive wafer analysis for various applications. The SiPHER is an automated photoluminescence metrology system for the detection and mapping of 300mm substrate defects and metallic contamination. The NanoSpec line of products includes the 3000 and 6100 supporting thin film measurement across all segments in both low volume production and research applications.
The company sells its metrology systems worldwide to semiconductor manufacturers and equipment suppliers, producers of HB-LEDs, solar PV panels, data storage devices, silicon wafers and photomasks. The majority of its systems are sold to customers located in Asia and the United States. Its customers include Samsung Electronics Co. Ltd. and Intel Corporation.
Sales and Marketing
The company provides direct sales, service and application support locally from its worldwide offices located in the USA, South Korea, Japan, Europe, Taiwan, China, and Singapore.
In the standalone segment, the companys principal competitors are KLA-Tencor and Nova Measuring Instruments. Its principal competitor in the integrated metrology segment is Nova Measuring Instruments.
Nanometrics Incorporated was founded in 1975.
The above Company Fundamental Report is a half-ready report and contents are subject to change.
It means that we have all necessary data in our database to prepare the report but need 2-3 days to complete it. During this time we are also updating the report with respect to the current moment. So, you can get all the most recent data available for the same price. Please note that preparation of additional types of analyses requires extra time.
1. NANOMETRICS INCORPORATED COMPANY PROFILE
1.1. Key facts
1.2. Financial Performance
1.3. Key Executives
1.4. Ownership and Major Holders
1.5. Company History
2. NANOMETRICS INCORPORATED BUSINESS OVERVIEW
2.1. Business Description
2.2. Major Products and Services
2.3. Markets and Sales Activities
2.4. Locations, Subsidiaries, Operating Units
3. NANOMETRICS INCORPORATED SWOT ANALYSIS
4. NANOMETRICS INCORPORATED FINANCIAL ANALYSIS
4.1. Financial Statements
4.1.1. Income Statement
4.1.2. Balance Sheet
4.1.3. Cash Flow
4.2. Financial Ratios
4.2.2. Margin Analysis
4.2.3. Asset Turnover
4.2.4. Credit Ratios
4.2.5. Long-Term Solvency
4.2.6. Growth Over Prior Year
4.2.7. Financial Ratios Charts
4.3. Stock Market Snapshot
5. NANOMETRICS INCORPORATED COMPETITORS AND INDUSTRY ANALYSIS
5.1. Nanometrics Incorporated Direct Competitors
5.2. Comparison of Nanometrics Incorporated and Direct Competitors Financial Ratios
5.3. Comparison of Nanometrics Incorporated and Direct Competitors Stock Charts
5.4. Nanometrics Incorporated Industry Analysis
5.4.1. Semiconductors Industry Snapshot
5.4.2. Nanometrics Incorporated Industry Position Analysis
6. NANOMETRICS INCORPORATED NEWS & EVENTS
6.1. News & PR Activity Analysis
6.2. IR Corporate News
6.3. Marketing News
6.4. Corporate Events
7. NANOMETRICS INCORPORATED EXPERTS REVIEW1
7.1. Experts Opinion
7.2. Experts Estimates
8. NANOMETRICS INCORPORATED ENHANCED SWOT ANALYSIS2
9. UNITED STATES PESTEL ANALYSIS2
9.1. Political Factors
9.2. Economic Factors
9.3. Social Factors
9.4. Technological Factors
9.5. Environmental Factors
9.6. Legal Factors
10. NANOMETRICS INCORPORATED IFE, EFE, IE MATRICES2
10.1. Internal Factor Evaluation Matrix
10.2. External Factor Evaluation Matrix
10.3. Internal External Matrix
11. NANOMETRICS INCORPORATED PORTER FIVE FORCES ANALYSIS2
12. NANOMETRICS INCORPORATED VRIO ANALYSIS2
APPENDIX: RATIO DEFINITIONS
LIST OF TABLES
Nanometrics Incorporated Key Facts
Income Statement Key Figures
Balance Sheet Key Figures
Cash Flow Statement Key Figures
Financial Performance Abbreviation Guide
Nanometrics Incorporated Key Executives
Key Executives Biographies1
Key Executives Compensations1
Nanometrics Incorporated Major Shareholders
Nanometrics Incorporated History
Nanometrics Incorporated Products
Revenues by Segment
Revenues by Region
Nanometrics Incorporated Offices and Representations
Nanometrics Incorporated SWOT Analysis
Yearly Income Statement Including Trends
Income Statement Latest 4 Quarters Including Trends
Yearly Balance Sheet Including Trends
Balance Sheet Latest 4 Quarters Including Trends
Yearly Cash Flow Including Trends
Cash Flow Latest 4 Quarters Including Trends
Nanometrics Incorporated Profitability Ratios
Margin Analysis Ratios
Asset Turnover Ratios
Long-Term Solvency Ratios
Financial Ratios Growth Over Prior Year
Nanometrics Incorporated Capital Market Snapshot
Nanometrics Incorporated Direct Competitors Key Facts
Direct Competitors Profitability Ratios
Direct Competitors Margin Analysis Ratios
Direct Competitors Asset Turnover Ratios
Direct Competitors Credit Ratios
Direct Competitors Long-Term Solvency Ratios
Semiconductors Industry Statistics
Nanometrics Incorporated Industry Position
Company vs. Industry Income Statement Analysis
Company vs. Industry Balance Sheet Analysis
Company vs. Industry Cash Flow Analysis
Company vs. Industry Ratios Comparison
Nanometrics Incorporated Consensus Recommendations1
Analyst Recommendation Summary1
Price Target Summary1
Experts Recommendation Trends1
Revenue Estimates Analysis1
Earnings Estimates Analysis1
Revenue Estimates Trend1
Earnings Estimates Trend1
LIST OF FIGURES
Nanometrics Incorporated Annual Revenues in Comparison with Cost of Goods Sold and Gross Profit
Profit Margin Chart
Operating Margin Chart
Return on Equity (ROE) Chart
Return on Assets (ROA) Chart
Debt to Equity Chart
Current Ratio Chart
Nanometrics Incorporated 1-year Stock Charts
Nanometrics Incorporated 5-year Stock Charts
Nanometrics Incorporated vs. Main Indexes 1-year Stock Chart
Nanometrics Incorporated vs. Direct Competitors 1-year Stock Charts
Nanometrics Incorporated Article Density Chart
1 – Data availability depends on company’s security policy.
2 – These sections are available only when you purchase a report with appropriate additional types of analyses.
The complete financial data is available for publicly traded companies.
Enhanced SWOT Analysis
Enhanced SWOT is a 3×3 grid that arranges strengths, weaknesses, opportunities and threats into one scheme:
- How to use the strengths to take advantage of the opportunities?
- How to use the strengths to reduce likelihood and impact of the threats?
- How to overcome the weaknesses that obstruct taking advantage of the opportunities?
- How to overcome the weaknesses that can make the threats a reality?
Upon answering these questions a company can develop a project plan to improve its business performance.
PESTEL (also termed as PESTLE) is an ideal tool to strategically analyze what influence different outside factors – political, economic, sociocultural, technological, environmental and legal – exert on a business to later chart its long term targets.
Being part of the external analysis when carrying out a strategic assessment or performing a market study, PESTEL gives an overview of diverse macro-environmental factors that any company should thoughtfully consider. By perceiving these outside environments, businesses can maximally benefit from the opportunities while minimizing the threats to the organization.
Key Factors Examined by PESTEL Analysis:
- Political – What opportunities and pressures are brought by political bodies and what is the degree of public regulations’ impact on the business?
- Economic – What economic policies, trends and structures are expected to affect the organization, what is this influence’s degree?
- Sociological – What cultural and societal aspects will work upon the demand for the business’s products and operations?
- Technological – What impact do the technological aspects, innovations, incentives and barriers have on the organization?
- Environmental – What environmental and ecological facets, both locally and farther afield, are likely to predetermine the business?
- Legal – What laws and legislation will exert influence on the style the business is carried out?
IFE, EFE, IE Matrices
The Internal Factor Evaluation matrix (IFE matrix) is a strategic management tool helping audit or evaluate major weaknesses and strengths in a business’s functional areas. In addition, IFE matrix serves as a basis for identifying and assessing relationships amongst those areas. The IFE matrix is utilised in strategy formulation.
The External Factor Evaluation matrix (EFE matrix) is a tool of strategic management that is typically utilised to assess current market conditions. It is an ideal instrument for visualising and prioritising the threats and opportunities a firm is facing.
The essential difference between the above mentioned matrices lies in the type of factors incorporated in the model; whilst the latter is engaged in internal factors, the former deals exceptionally with external factors – those exposed to social, political, economic, legal, etc. external forces.
Being a continuation of the EFE matrix and IFE matrix models, the Internal External matrix (IE matrix) rests upon an investigation of external and internal business factors integrated into one suggestive model.
Porter Five Forces Analysis
The Porter’s five forces analysis studies the industry of operation and helps the company find new sources of competitive advantage. The analysis surveys an industry through five major questions:
- What composes a threat of substitute products and services?
- Is there a threat of new competitors entering the market?
- What is the intensity of competitive rivalry?
- How big is the bargaining power of buyers?
- How significant is the bargaining power of suppliers?
VRIO stands for Value, Rarity, Imitability, Organization. This analysis helps to evaluate all company’s resources and capabilities and bring them together into one aggregate table that includes:
- Tangible resources
- Intangible resources
- Innovation and Creativity
- Organizational capabilities
The result of the analysis gives a clear picture of company’s competitive and economic implications, answering the questions if the resources mentioned above are:
- Costly to imitate?
- Organized properly?