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Global Sputtering Targets Market 2021

January 2022 | 21 pages | ID: GAB39C5021F3EN
StrategyHelix Inc

US$ 2,750.00

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Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. The global sputtering targets market is poised to grow by US$ 1,433 million during 2021-2027, progressing at a CAGR of 6.4% during the forecast period, according to data and analytics company StrategyHelix.

The report provides up-to-date market size data for period 2017-2020 and forecast to 2027 covering key market aspects like sales value for sputtering targets. The global sputtering targets market is segmented on the basis of material, application, and region. By material, the global sputtering targets market has been segmented into metals & pure elements, oxides, alloys, others. According to the research, the metals & pure elements segment had the largest share in the global sputtering targets market. Based upon application, the global sputtering targets market is categorized into data storage, displays, energy, industrial, microelectronics, optical coatings, others. In 2020, the energy segment made up the largest share of revenue generated by the sputtering targets market. Geographically, the global sputtering targets market is segmented into North America, Asia Pacific, Europe, Rest of the World (ROW).

The global sputtering targets market is highly competitive. The leading players in the sputtering targets market include Beijing Goodwill Metal Technology Co. Ltd., China New Metal Materials Technology Co. Ltd., Corning Inc., Daido Steel Co. Ltd., FURUYA METAL Co. Ltd., GRIKIN Advanced Material Co. Ltd, H.C. Starck GmbH, Hitachi Metals Ltd., Honeywell International Inc., JX Nippon Mining & Metals Corporation, Kobe Steel Ltd., Materion Corporation, Mitsui Mining & Smelting Co. Ltd. (MMS), Plansee SE, Praxair Inc., Sumitomo Chemical Co. Ltd., Tosoh Corporation, ULVAC Inc., Umicore N.V.

Report Scope
Material: metals & pure elements, oxides, alloys, others
Application: data storage, displays, energy, industrial, microelectronics, optical coatings, others
Region: North America, Asia Pacific, Europe, Rest of the World (ROW)
Years considered: this report covers the period 2017 to 2027

Key Benefits for Stakeholders
Get a comprehensive picture of the global sputtering targets market
Pinpoint growth sectors and trends for investment
PART 1. INTRODUCTION

Scope of the study
Study period
Geographical scope
Research methodology

PART 2. SPUTTERING TARGETS MARKET OVERVIEW

PART 3. MARKET BREAKDOWN BY MATERIAL

Metals & pure elements
Oxides
Alloys
Others

PART 4. MARKET BREAKDOWN BY APPLICATION

Data storage
Displays
Energy
Industrial
Microelectronics
Optical coatings
Others

PART 5. MARKET BREAKDOWN BY REGION

North America
Asia Pacific
Europe
Rest of the World (ROW)

PART 6. KEY COMPANIES

Beijing Goodwill Metal Technology Co., Ltd.
China New Metal Materials Technology Co., Ltd.
Corning Inc.
Daido Steel Co., Ltd.
FURUYA METAL Co., Ltd.
GRIKIN Advanced Material Co., Ltd
H.C. Starck GmbH
Hitachi Metals, Ltd.
Honeywell International Inc.
JX Nippon Mining & Metals Corporation
Kobe Steel, Ltd.
Materion Corporation
Mitsui Mining & Smelting Co., Ltd. (MMS)
Plansee SE
Praxair, Inc.
Sumitomo Chemical Co., Ltd.
Tosoh Corporation
ULVAC, Inc.
Umicore N.V.
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